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Equipment 단위 대학요율 연구소/기업체요율
직접수행 공정의뢰 직접수행 공정의뢰
E-beam litho. System /30min 100,000 150,000 200,000 300,000
/30min 50,000 75,000 100,000 150,000
i-line stepper 1 /wafer 28,000 42,000 56,000 84,000
i-line stepper 2 /wafer 28,000 42,000 56,000 84,000
Midas mask aligner /10min 7,000 10,500 14,000 21,000
PR Track /wafer 15,000 22,500 30,000 45,000
CD-SEM /hr 30,000 45,000 60,000 90,000
E-beam wet station /login 50,000 75,000 75,000 150,000
PR/Developer /wafer 50,000 75,000 100,000 150,000
PR wet station_cratto
Kyowa mask aligner /10min 7,000 10,500 14,000 21,000
PR Coater 1 /wafer 10,000 15,000 20,000 30,000
PR Coater 2 /wafer 10,000 15,000 20,000 30,000
PR wet station /hr 15,000 22,500 30,000 45,000
Bake Oven 1 /10min 3,000 4,500 6,000 9,000
Bake Oven 2 /10min 3,000 4,500 6,000 9,000
Visual microscope /10min 5,000 7,500 10,000 15,000
6˝furnace 1
(Dry Ox,Wet Ox,Metal alloy)
/회 100,000 150,000 200,000 300,000
/hr 10,000 15,000 20,000 30,000
6˝furnace 2
(N+ anneal, P+ anneal)
/회 100,000 150,000 200,000 300,000
/hr 10,000 15,000 20,000 30,000
High temp. Anneal furnace /회 100,000 150,000 200,000 300,000
/hr 10,000 15,000 20,000 30,000
LPCVD /회 120,000 180,000 240,000 360,000
/0.1㎛ 10,000 15,000 20,000 30,000
TEOS LPCVD /회 150,000 225,000 300,000 450,000
/0.1㎛ 10,000 15,000 20,000 30,000
Dpoly LPCVD /회 150,000 225,000 300,000 450,000
/0.1㎛ 10,000 15,000 20,000 30,000
Metal ALD /wafer 15,000 22,500 30,000 45,000
Dielectric ALD /wafer 15,000 22,500 30,000 45,000
Activation RTP /wafer 20,000 30,000 40,000 60,000
Silicide RTP /10min 7,500 11,250 15,000 22,500
박막두께측정기 /10min 3,000 4,500 6,000 9,000
Nanospec /10min 3,000 4,500 6,000 9,000
Ellipsometer /10min 3,000 4,500 6,000 9,000
4˝ furnace 1 /회 100,000 150,000 200,000 300,000
/hr 10,000 15,000 20,000 30,000
4˝ furnace 2 /회 100,000 150,000 200,000 300,000
/hr 10,000 15,000 20,000 30,000
4˝ furnace 3 /회 100,000 150,000 200,000 300,000
/hr 10,000 15,000 20,000 30,000
ALD /wafer 10,000 15,000 20,000 30,000
Compound RTP /10min 5,000 7,500 10,000 15,000
Alpha-Step /10min 3,000 4,500 6,000 9,000
Ellipsometer /10min 3,000 4,500 6,000 9,000
Ion Implanter /회 120,000 180,000 240,000 360,000
/wafer 30,000 45,000 60,000 90,000
Pulsed PLAD /wafer 30,000 45,000 60,000 90,000
Metal Sputter /wafer 30,000 45,000 60,000 90,000
/0.1㎛ 5,000 7,500 10,000 15,000
PECVD /10min 10,000 15,000 20,000 30,000
Evaporator /회 25,000 37,500 50,000 75,000
Dielectric Sputter /wafer 30,000 45,000 60,000 90,000
/0.1㎛ 5,000 7,500 10,000 15,000
Cluster etcher /10min 40,000 60,500 80,000 120,000
Oxide/Nitride etcher /10min 30,000 45,000 60,000 90,000
Poly-Si etcher /10min 30,000 45,000 60,000 90,000
Metal etcher /10min 10,000 15,000 20,000 30,000
PR asher /10min 10,000 15,000 20,000 30,000
Wet station & SRD (Pre-thermal) /hr 15,000 22,500 30,000 45,000
Wet station & SRD (RCA) /hr 15,000 22,500 30,000 45,000
Wet station & SRD (TMAH) /hr 15,000 22,500 30,000 45,000
/회 150,000 225,000 300,000 450,000
Metal wet station /hr 15,000 22,500 30,000 45,000
TCP etcher /10min 3,000 4,500 6,000 9,000
ICP etcher /10min 5,000 7,500 10,000 15,000
RIE /10min 5,000 7,500 10,000 15,000
Wet station (piece) /hr 15,000 22,500 30,000 45,000
Wet station & SRD (wafer) /hr 15,000 22,500 30,000 45,000
양극반응조 /회 20,000 30,000 40,000 60,000
TMAH Bath /회 100,000 150,000 200,000 300,000
FE-SEM /hr 20,000 30,000 40,000 60,000
AES /hr 15,000 22,500 30,000 45,000
PL /hr 15,000 22,500 30,000 45,000
AFM /10min 3,000 4,500 6,000 9,000
Hall measurement /10min 3,000 4,500 6,000 9,000
4-point probe /10min 3,000 4,500 6,000 9,000
110GHz Network analyzer /hr 15,000 22,500 30,000 45,000
Semiauto probe station
DC supply (PNA)
DIVA /hr 20,000 30,000 40,000 60,000
4156C IV meter /hr 8,000 12,000 16,000 24,000
4155A IV meter
4280A CV meter
4284A LCR meter
Manual probe station 1, 2
STA 1,2,3 /hr 10,000 15,000 20,000 30,000
Analog signal generator /hr 15,000 22,500 30,000 45,000
Data generator /hr 10,000 25,000 20,000 30,000
MOCVD(S) /회 400,000 600,000 800,000 1,200,000
MOCVD(V) /회 300,000 450,000 600,000 900,000
Highmac microscope /10min 3,000 4,500 6,000 9,000
Cluster PECVD /hr 30,000 45,000 60,000 90,000
OLED 제조장비 /wafer 50,000 75,000 100,000 150,000
Excimer laser system /hr 20,000 30,000 40,000 60,000
FPMS /hr 10,000 15,000 20,000 30,000
두께측정기 /hr 5,000 7,500 10,000 15,000
Dicing Saw /10min 5,000 7,500 10,000 15,000
Spin dryer
UV curing
Tape Mounter
Polisher
Expander
Wire bonder /10min 5,000 7,500 10,000 15,000
우)41566 대구광역시 북구 대학로 80 (산격동,경북대학교) 경북대학교 IT대학 3호관 203호 반도체융합기술연구원

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